Cicel Vacuum Chrome Plating System for Plastic, Magnetron Sputtering Chrome Coating Equipment, Vacuum Deposition System (CCZK-ION)

One form of PVD coating technology is magnetron sputtering. The vacuum chamber of the PVD coating machine is filled with an inert gas, such as argon. By applying a high voltage, a glow discharge is created, resulting in acceleration of ions to the target surface from the target. Often an additional gas such as nitrogen or acetylene is used, which will react with the ejected material (reactive sputtering).

Magnetron sputtering uses magnetic fields to increase the plasma density in front of the target. Resulting in increased efficiency, higher sputter rates and improved ion bombardment during the growth of the coating. The coatings are mostly used for tribological and decorative applications.

• Parts are sprayed with a basecoat.
• Parts are racked and placed into the sealed chamber.
• Argon gas is introduced in a continuous flow.
• Electricity creates an active Argon plasma field in front of the cathode.
• Positively charged Argon atoms are accelerated through a magnetic field.
• The target is bombarded with ion particles, breaking off atoms of the target material.
• Target atoms are "shot" onto the surface of the parts.
• The part is finished with a protective top coat.