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Home > Anterior Cervical Plating Systems > CVD Ald Atomic Layer Deposition System for Powder Coating Plating
CVD Ald Atomic Layer Deposition System for Powder Coating Plating
CVD Ald Atomic Layer Deposition System for Powder Coating Plating
CVD Ald Atomic Layer Deposition System for Powder Coating Plating
CVD Ald Atomic Layer Deposition System for Powder Coating Plating
CVD Ald Atomic Layer Deposition System for Powder Coating Plating
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CVD Ald Atomic Layer Deposition System for Powder Coating Plating
CVD Ald Atomic Layer Deposition System for Powder Coating Plating
CVD Ald Atomic Layer Deposition System for Powder Coating Plating
CVD Ald Atomic Layer Deposition System for Powder Coating Plating
CVD Ald Atomic Layer Deposition System for Powder Coating Plating

CVD Ald Atomic Layer Deposition System for Powder Coating Plating

Customization: Available
After-sales Service: Onlin
Warranty: 1
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Product Description

📋

Technical Overview

Model NO.
CY-ALD
Type
Coating Production Line
Coating
Vacuum Coating
Certification
CE
Wafer Dimension
8 Inch and Below
Wafer Temperature
Rt-400c (±0.1c Precision)
ALD Valve
Swagelok ALD Swift Valve
Background Vacuum
<5*10-3torr
🚀

Product Description

CVD ALD Atomic Layer Deposition System for Powder Coating Plating

The Thermal Atomic Layer Deposition System is a single-wafer deposition system specially designed for scientific research and small-scale experiments. Fully compliant with CE criteria, it is widely utilized in micro-electronics, nano-materials, optical films, and solar battery technology.

Product Benefits

  • Advanced software controlling system with integrated technological formulation.
  • Precise parameter setting and interlocking alarming systems.
  • State supervisory control for consistent experimental results.

Applicable Materials

Elementary substances: Co, Cu, Ta, Ti, W, Ge, Pt, Ru, Ni, Fe...
Nitrides: TiN, SiN, AlN, TaN, ZrN, HfN, WN...
Oxides: TiO2, HfO2, SiO2, ZnO, ZrO2, Al2O3, La2O3, SnO2...

Application Fields

  • High-k gate oxides
  • Storage capacitor dielectrics
  • Highly conformal coatings for MEMS
  • Pinhole-free passivation for OLEDs
  • Coating of nanoporous structures
  • Solar battery production
  • Optical thin-film development
  • Doping of special fiber
⚙️

Technical Parameters

Wafer Dimension 8 inch and below
Wafer Temperature RT-400ºC, Controlling precision ±0.1ºC
Number of Precursors Three precursor lines (Optional more)
Temperature of Precursor Lines RT-200ºC, Controlling precision ±0.1ºC
Gas Carrier System N2 or Ar
Growing Mode Consecutive or interval deposition mode
Controlling System PLC plus touch screen or display
Deposition Heterogeneity <±1%
Dimensions 600mm x 600mm x 1100mm
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Detailed Equipment Photos

ALD System 1
ALD System 2
ALD System 3
ALD System 4
ALD System 5
ALD System 6
ALD Process Detail Technical Layout
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Frequently Asked Questions

Are you a manufacturer or a trading company?
We are professional laboratory instrument manufacturers with our own design team and factory, ensuring high quality and optimal pricing.
What is the warranty and after-sales service policy?
The product warranty period is 12 months, and we provide lifetime maintenance. Technical issues are typically addressed within 24 hours.
How long is the delivery time for standard and customized units?
Stock items deliver in 5-10 days. Customized instruments usually take 30-60 days depending on the specific technical requirements.
Can you accommodate different power supply standards?
Yes, we can supply transformers and plugs according to your local power requirements and national standards.
What are the accepted payment methods?
We accept T/T, L/C, D/P, and other secure payment methods, including Trade Guarantee.
How is the equipment packaged for international shipping?
Products are secured in standard export fumigation-signed wooden boxes. Delivery is available via express, air, or sea shipping.

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