CVD Ald Atomic Layer Deposition System for Powder Coating Plating

Customization:	Available
After-sales Service:	Onlin
Warranty:	1

Basic Information

Model NO.

CY-ALD

Type

Coating Production Line

Coating

Vacuum Coating

Certification

CE

Condition

New

Wafer Dimension

8 Inch and Below

Wafer Temp.

Rt-400c (±0.1c)

ALD Valve

Swagelok Ald Swift Valve

Vacuum

<5*10-3torr

Carrier Gas

N2 or Ar

Product Description

💡

CVD ALD Atomic Layer Deposition System is a single-wafer deposition system specially designed for scientific research and small-scale experiments. It is widely used in micro-electronics, nano materials, optical films, and solar battery fields.

Key Benefits:
Advanced software controlling system integrating technological formulation, parameter setting, popedom setting, interlocking alarming, and state supervisory control.

Supported ALD Films:

Elementary: Co, Cu, Ta, Ti, W, Ge, Pt, Ru, Ni, Fe…
Nitride: TiN, SiN, AlN, TaN, ZrN, HfN, WN …
Oxide: TiO2, HfO2, SiO2, ZnO, ZrO2, Al2O3, La2O3, SnO2…
Others: GaAs, AlP, InP, GaP, InAs, LaHfxOy, SrTiO3, SrTaO6…

Application Fields:

High-k gate oxides & Capacitor dielectrics
Passivation layers for OLEDs and polymers
Highly conformal coatings for MEMS
Coating of nanoporous structures
Solar battery & Optical thin-film

Technical Parameters

Wafer Dimension	8 inch and below
Wafer Temperature	RT-400ºC, Precision ±0.1ºC
Number of Precursor	Three precursor lines (Optional more)
Precursor Line Temp.	RT-200ºC, Precision ±0.1ºC
Source Bottle Temp.	RT-200ºC, Precision ±0.1ºC
ALD Valve	Swagelok ALD swift valve
Background Vacuum	<5*10-3 Torr
Gas Carrier System	N2 or Ar
Growing Mode	Consecutive or interval deposition mode
Controlling System	PLC plus touch screen or display
Heterogeneity	<±1%
Dimensions	600mm x 600mm x 1100mm

Detailed Photos

Frequently Asked Questions

What materials can be deposited using this ALD system?

The system supports a wide range of materials including oxides (Al2O3, TiO2, HfO2), nitrides (TiN, AlN), elementary substances (Cu, Co, Pt), and various complex structures like GaAs or SrTiO3.

What is the temperature control precision for the wafer?

The system provides a wafer temperature range from RT to 400ºC with a high controlling precision of ±0.1ºC.

Can the number of precursor lines be customized?

Yes, the standard configuration includes three precursor lines, but optional additional lines can be added based on your specific research requirements.

What is the typical delivery time for the equipment?

For standard in-stock items, delivery takes 5-10 days. For customized instruments, the lead time typically ranges from 30 to 60 days depending on the specifications.

How is the equipment packaged for international shipping?

We use standard export fumigation-free wooden box packaging to ensure the safety of the instrument during transit via sea, air, or express.

Do you support different power supply standards?

Yes, we can supply transformers and plugs according to your local requirements (e.g., 220V/110V) to match different international standards.

CVD Ald Atomic Layer Deposition System for Powder Coating Plating

Product Description

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